AMAT 0010-23715
Part Number: 0010-23715
Manufacturer: Applied Materials (AMAT)
Category: Semiconductor Vacuum Process Component
Equipment Field: Wafer Etch / Deposition Chamber Parts
1. General Description
AMAT 0010-23715 is an OEM critical process component for Applied Materials semiconductor fabrication tools. It is applied in high-vacuum process chambers, used for gas distribution, vacuum sealing, thermal insulation or plasma shielding, adapting to extreme environments such as high vacuum, high temperature and plasma etching.
2. Key Specifications
• Application Environment: Ultra-high vacuum, high temperature, plasma ambient
• Material: High-purity alloy / stainless steel / ceramic composite
• Cleanliness Grade: Semiconductor Class 10 cleanroom standard
• Feature: Low outgassing, corrosion & plasma resistant
• Process Compatibility: Etch, CVD, PVD, Implant process tools
3. Core Features
• Excellent chemical inertness with process specialty gases
• High dimensional accuracy for chamber precise assembly
• Anti-particle contamination design for wafer process
• Long service life under continuous high-temperature vacuum operation
4. Typical Applications
• Applied Materials vacuum process chamber assembly
• Semiconductor wafer etching & thin film deposition equipment
• Ion implantation and vacuum transmission system
• Fab production line spare parts replacement & maintenance
Applied Materials © 0010-23715 Semiconductor Component
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